Getting My Noohapou To Work
Getting My Noohapou To Work
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distant spots: Static models are generally located remotely, raising Value and reducing All round program effectiveness.
Tool & TCU computer software calibration processes change external take a look at products not utilized regularly for verifying
the knowledge below is categorized by semiconductor system and Device producer. Each table incorporates an purposes Matrix that displays qulified and business procedures.
at first founded in 1985, our company has grown right into a acknowledged leader in supplying temperature Manage units to the worldwide semiconductor field.
LAUDA-Noah will, for your client's retrofit evaluation, keep track of and alter its fluid temperature Manage profiles to match an present TCUs' to be able to guarantee a smooth approach integration by using DAQ.
we're guided within our perception get more info that prosperity On this aggressive market stems from offering clients with very engineered new solutions and earth course customer service.
All static TCUs demand excess cooling & heating capacities because of their pretty massive process fluid reservoirs. the method fuid reservoir on LAUDA-Noah's dynamic temperature control system is below 1 gallon.
With all the POU3300, you can reach unprecedented ends in etch performance, chamber uptime, diminished price of ownership and fab Place utilization – all whilst improving upon your course of action trustworthiness.
massive Footprint: Static models occupy important space throughout the fabrication Software space, lessening its performance.
Dynamic Temperature Management, as carried out in devices similar to the LAUDA-Noah POU, is surely an strategy that senses the temperature of the process fluid coming back from the procedure chamber’s wafer chuck (ESC) and dynamically adjusts the temperature from the provided system fluid determined by this authentic-time opinions.
The data established here is from the 200mm quantity output wafer fab and Evidently illustrates the advantage of the LAUDA-Noah POU method.
The POU3300 method features dynamic temperature control of the process chamber cathode / electrode / anode and may be synchronized with any etch procedure.
the fact is always that true Dynamic Temperature Command can only be reached when all 5 (five) of the next procedure design and installation demands are achieved:
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